Joseph C Nabity

Their homepage, crawled JUL 31, 2026

At a glance

EmployeesNot reported

In business sinceNot reported

Industry

Semiconductor Machinery Manufacturing

HeadquartersBozeman, MT

SAM.gov UEIFUJDD86HBA67

The Nanometer Pattern Generation System (NPGS) is software for direct write lithography that works with commercial electron beam or ion beam microscopes, including scanning electron microscopes, focused ion beam systems, and helium ion microscopes. The system is used for advanced electron beam lithography and ion beam lithography applications, primarily at research institutions. No certifications are named in the text.

Compiled from federal records — EPA, OSHA, SAM.gov and the U.S. Census — and from the company’s own website. Federal source data is public domain. Each plant’s page names the source of every field.